Nano-Patterned Sapphire Substrate, NPSS

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The periodic sapphire nano-structure is fabricated by etching technology, carriers for gallium nitride glowing and world wide material for high brightness blue light emitting diode.

Advantages of nano patterned sapphire substrate (NPSS):

  • • Enhance the light extraction of LED.
  • • Improve the electrical performance of LED.

Advantages of NPSS than PSS:

  • • High uniformity of sub-micro structure patterned by nano-imprinting.
  • • Increase throughput of dry etching and epitaxy equipment.
Orientation Surface Orientation : C-plain (0001)
Orientation Flat : A-plane (11-20)
Wafer Size

Diameter : 50.8 +/- 0.2 mm
Thickness : 430 +/- 25 mm

Front Surface(Pattern Size) Pitch: 1000nm
Height: 600nm
Bottom Diameter: 900nm
Arrangement : Trigonal
Back Surface

Finishing : Fine Ground